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1·Ti, Al)N super hard films were deposited by multi arc ion plating.

采用多弧离子镀技术沉积氮化钛铝超硬反应膜。

2·A new coating technology, arc discharge ion plating has been developed.

一种新的镀膜技术——电弧放电离子镀研制成功。

3·The ion plating is a new technique combined vacuum evaporation plating with sputtering.

离子镀是真空蒸镀与溅射相结合的新工艺。

4·Arc ion plating or magnetron sputtering provides the best application condition for pulse technique.

电弧或溅射离子镀高的离化率为脉冲工艺提供了最好的应用条件。

5·Mechanical and optical properties of titanium dioxide films prepared by pulsed bias arc ion plating;

在脉冲真空电弧离子镀膜过程中，膜层厚度的控制至关重要。

6·This paper expounds, the mechanism and features of ion Plating-penetrating metal with high-temperature.

文中对高温离子镀渗金属的机理和特点作了阐述。

7·Then, black Sn-Ni alloy plating and ti carbide ion plating, quite well received currently, are discussed.

其次是黑色镀层，探讨了目前较受欢迎的电镀黑色锡镍合金及离子镀碳化钛。

8·The Langmuir double probe system based on Virtual Instrument was used to diagnose arc ion plating plasmas.

本文利用基于虚拟仪器的朗缪尔双探针系统对电弧离子镀等离子体进行了诊断研究。

9·It was proved that pitting potential become more noble and pitting resistance was improved after ion plating.

结果表明，离子镀使孔蚀电位提高，改善和提高了抗孔蚀性能。

10·ABSTRACT the application of pulse technique on arc ion plating and magnetron sputtering is summarized in the article.

摘要本文综述了国内外脉冲工艺在电弧离子镀和磁控溅射中的应用。