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1·The invention mainly relates to a new material and process for immersion lithography.

本发明主要涉及浸渍光刻技术的新材料和工艺。

2·Coating compositions of the invention are useful as photoresist overcoat layers, including in immersion lithography processing.

本发明的涂料组合物可用作光致抗蚀剂的覆盖涂层，包括可用在浸渍平版印刷工艺中。

3·It will also use copper interconnects, low-k, strain silicon and other features. Like 32-nm, Intel will make use of 193-nm immersion lithography.

这款产品将使用Intel第三代HKMG工艺，第五代硅应变技术，另外与32nm类似，22nm制程仍将继续使用193nm液浸式光刻技术。

4·The fluid transmission mechanism is a key infrastructure of immersion lithography equipment, which is used to execute the liquid dispensation and recovery, and ensures no leakage or bubbles.

浸没液体传送装置是浸没光刻设备中的一个关键组件，用来实现缝隙内液体的平稳注入和回收，同时保证无泄漏和气泡产生。

5·An apparatus and method for maintaining immersion fluid (212) in the gap adjacent the projection lens (16) during the exchange of a work piece (208) in a lithography machine (10) is disclosed.

本发明公开一种设备和方法，用于在更换平板印刷机(10)中工件(208)期间，将浸没流体(212)保持在邻接投射透镜(16)的间隙中。