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1·ZrO_2 films deposited by electron beam evaporation method are treated by oxygen plasma.

用低能氧等离子体对电子束热蒸发后的沉积氧化锆薄膜进行了后处理。

2·Ta2O5 films are prepared on BK7 substrates with conventional electron beam evaporation deposition.

Ta2O5薄膜采用传统的电子束蒸发方法沉积在BK7基底上。

3·The flat polarizer was prepared by electron beam evaporation and its optical performance was measured by Lambda900 spectrometer.

采用电子束蒸发沉积技术制备了平板偏振膜。

4·A sample was fabricated through electron beam evaporation technique, and its optical performance absolutely satisfied the requirements.

最后利用电子束蒸发技术制备了薄膜样品，样品的光谱性能完全能够满足使用要求。

5·By means of electron beam evaporation and ion source auxiliary technology, the paper shows the influence of the number of layers on the quality of film polarization beam splitter prism.

采用电子枪蒸镀离子源辅助技术，讨论了薄膜层数对偏振分束棱镜性能的影响。

6·The fabrication methods of MPC include electron beam lithography with subsequent evaporation and lift-off, interference lithography with dry-etching technology etc.

制备金属光子晶体方法包括：电子束刻蚀结合后续剥离法、激光干涉光刻结合干刻蚀技术等。

7·High quality ITO films are prepared onto K9 glass substrates by oxygen ion-assisted electron beam reactive evaporation.

采用氧离子辅助电子束反应蒸发工艺在K9玻璃基底上制备了性能优异的ITO薄膜。

8·The thin film can be prepared by a plurality of film plating techniques such as high vacuum thermal evaporation, electron beam deposition and sputtering.

该薄膜可采用高真空热蒸发、电子束沉积以及溅射等多种镀膜技术制备。

9·The application and features of vaccum strip coating processes such a thermal jet evaporation, magnetron sputtering, electron-beam evaporation and plasma enhanced EB evaporation process were reviewed.

介绍了新一代连续带钢镀膜技术-真空镀膜的工艺特点及应用现状。